Otsu, Japan

Koji Syoki

This inventor holds 3 USPTO granted patents. Top assignee: Toyo Boseki Kabushiki Kaisha. Active years: 2005-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koji Syoki. Retrieved from https://idiyas.com/inventor/koji-syoki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 33.3

Average Co-Inventor Count = 5.6

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2005-2006

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Koji Syoki: Innovator in Photosensitive Resin Technology

Introduction

Koji Syoki is a notable inventor based in Ohtsu, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 3 patents. His work has been instrumental in advancing materials used in various applications.

Latest Patents

Among his latest patents is a photosensitive resin laminate that comprises at least a support, a photosensitive resin layer, and an IR ablation layer. This innovative laminate features an IR absorbent metal layer that is disposed in contact with the photosensitive resin layer. This technology enhances the performance and efficiency of photosensitive materials.

Career Highlights

Koji Syoki is associated with Toyo Boseki Kabushiki Kaisha, where he has been able to apply his expertise in developing advanced materials. His work has garnered attention in the industry, showcasing his commitment to innovation.

Collaborations

He has collaborated with notable coworkers such as Keiichi Motoi and Yuji Taguchi, contributing to various projects that push the boundaries of technology in their field.

Conclusion

Koji Syoki's contributions to photosensitive resin technology highlight his role as an innovator in the industry. His patents and collaborations reflect a dedication to advancing material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…