Chiba, Japan

Koji Ota

This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2005-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koji Ota. Retrieved from https://idiyas.com/inventor/koji-ota-hxbnyehu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 2

Forward Citations = 45(Granted Patents)


Company Filing History:


Years Active: 2005-2008

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2 patents (USPTO):Explore Patents

Title: Koji Ota: Innovator in Substrate Support Technology

Introduction

Koji Ota is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of substrate support technology, holding 2 patents that enhance the functionality and durability of lift pins used in various applications.

Latest Patents

His latest patents include the "Substrate Support Lift Pin" and the "Reduced Friction Lift Pin." The substrate support features a lift pin with a larger diameter shoulder section that creates a relief region between the lift pin and the guide hole. This design minimizes contact between the substrate support and the lift pin guide hole, effectively reducing pin scratching, particle generation, and component wear. Additionally, it increases the useful life of the pin. In another embodiment, a flat-bottom tip is introduced to promote self-standing of the lift pin, which reduces tilting or leaning within the guide hole.

Career Highlights

Koji Ota is currently employed at Applied Materials, Inc., where he continues to innovate and develop advanced technologies in substrate support systems. His work has been instrumental in improving the efficiency and reliability of manufacturing processes.

Collaborations

Some of his coworkers include David T Or and Keith K Koai, who collaborate with him on various projects within the company.

Conclusion

Koji Ota's contributions to substrate support technology demonstrate his commitment to innovation and excellence in his field. His patents reflect a deep understanding of the challenges faced in manufacturing, and his solutions are paving the way for improved performance and longevity of critical components.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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