Kawasaki, Japan

Koji Ohyama

This inventor holds 1 USPTO granted patent. Top assignee: Nikkin Flux Inc.. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koji Ohyama. Retrieved from https://idiyas.com/inventor/koji-ohyama-77vl6wan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Koji Ohyama: Innovator in Aluminum-Silicon Alloy Technology

Introduction

Koji Ohyama is a notable inventor based in Kawasaki, Japan. He has made significant contributions to the field of materials science, particularly in the development of methods for enhancing aluminum alloys. His innovative approach has led to advancements that benefit various industrial applications.

Latest Patents

Ohyama holds a patent for a method of adding silicon to aluminum. This method is characterized by the addition of silicon particles, with diameters ranging between 2 mm and 50 mm, to molten aluminum. The process also involves a flux represented by the general formula XaMFb, where 'X' is an element from the third or fourth period of the Periodic Table, 'M' is a III or IV group element, and 'F' is fluorine. Notably, a portion of the flux may be applied as a coating on the surface of the silicon particles.

Career Highlights

Ohyama is associated with Nikkin Flux Inc., where he continues to work on innovative solutions in the field of metallurgy. His expertise in aluminum-silicon alloys has positioned him as a key figure in the industry.

Collaborations

Ohyama collaborates with Masaki Tsunoda, contributing to the advancement of their shared projects and innovations.

Conclusion

Koji Ohyama's work in the field of aluminum-silicon alloy technology exemplifies the impact of innovative thinking in materials science. His contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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