Koji Mitamura

Title: Koji Mitamura: Innovator in Thin Film Technology

Introduction

Koji Mitamura is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of thin film technology, particularly through his innovative methods for producing high refractive index and high transparency films. His work has implications in various industries, including optics and electronics.

Latest Patents

Mitamura holds a patent for a "Method for producing thin film having high refractive index and high transparency, and thin film produced by the method." This patent outlines a process that allows for the easy and quick production of patterned thin films. The method involves three key steps: forming a coating on a substrate using a sol containing a metal oxide modified with a phosphorus compound, curing the coating through light irradiation, and further enhancing the cured film by applying heat and/or additional light irradiation. This innovative approach has the potential to advance the production of high-quality thin films.

Career Highlights

Throughout his career, Mitamura has worked with esteemed organizations such as the Osaka Municipal Technical Research Institute and Daihachi Chemical Industry Co., Inc. His experience in these institutions has allowed him to refine his expertise in material science and thin film production.

Collaborations

Mitamura has collaborated with notable colleagues, including Kimihiro Matsukawa and Seiji Watase. These partnerships have contributed to the advancement of research and development in the field of thin films.

Conclusion

Koji Mitamura's contributions to thin film technology through his innovative methods and collaborations highlight his importance as an inventor. His work continues to influence advancements in various applications, showcasing the impact of his inventions in the industry.