The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2017
Filed:
Aug. 20, 2014
Osaka Municipal Technical Research Institute, Osaka, JP;
Daihachi Chemical Industry Co., Ltd., Osaka, JP;
Kimihiro Matsukawa, Osaka, JP;
Seiji Watase, Osaka, JP;
Koji Mitamura, Osaka, JP;
Manabu Hirata, Osaka, JP;
OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE, Osaka, JP;
DAIHACHI CHEMICAL INDUSTRY CO., LTD., Osaka, JP;
Abstract
Provided are a method for easily and quickly producing a patterned thin film having a high refractive index and a high transparency, and a highly refractive thin film produced by the method. The method comprises a first step: a step of forming, on a substrate, a coating using a sol containing a metal oxide modified with a phosphorus compound represented by the following formula (1): (wherein Ris a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an aryl group, an aliphatic heterocyclic group, or an aromatic heterocyclic group; Ris a divalent organic residue; and n is 1 or 2); a second step: a step of curing the coating on the substrate obtained in the first step by light irradiation; and a third step: a step of further adding energy to the cured film obtained in the second step by heating and/or light irradiation.