This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2003.
Company Filing History:
Years Active: 2003
Title: The Innovative Contributions of Koji Mita
Introduction
Koji Mita is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of materials science, particularly in the development of antistatic inorganic fillers. His work has implications for various industries, including plastics and rubber manufacturing.
Latest Patents
Mita holds a patent for an "Antistatic inorganic filler, resin composition containing the filler and method for preparing the inorganic filler." This innovative filler comprises an inorganic filler, an organic dispersant applied onto its surface, and an organic antistatic agent. The patent outlines methods for preparing the inorganic filler, which include wet-grinding the filler in the presence of an organic dispersant and subsequently mixing it with an organic antistatic agent. The resulting inorganic filler is designed to impart long-lasting antistatic properties to plastic and rubber materials, while also providing excellent rigidity, heat resistance, and impact resistance.
Career Highlights
Throughout his career, Koji Mita has focused on enhancing the performance of materials through innovative solutions. His patent reflects a deep understanding of material properties and their applications in real-world scenarios. Mita's work is a testament to the importance of research and development in advancing technology.
Collaborations
Mita has collaborated with talented individuals such as Seiji Katayama and Yumiko Takase. These partnerships have likely contributed to the success of his projects and the advancement of their shared goals in materials science.
Conclusion
Koji Mita's contributions to the field of materials science, particularly through his patented antistatic inorganic filler, demonstrate his innovative spirit and commitment to improving material performance. His work continues to influence the industry and pave the way for future advancements.