Company Filing History:
Years Active: 2005-2011
Title: The Innovative Contributions of Koji Ibi
Introduction
Koji Ibi is a notable inventor based in Kasugai, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Ibi's work has had a considerable impact on the industry.
Latest Patents
Ibi's latest patents include a plasma etching method and apparatus designed for etching semiconductor wafers. This plasma etching apparatus features a reaction tube made of a dielectric material, along with a high-frequency antenna positioned around the reaction tube to generate plasma within it. The high-frequency antenna includes a sloped segment that enhances capacitive coupling with the reaction tube. Additionally, the antenna is capable of being moved by a driver around the reaction tube in a horizontal plane, allowing for improved etching precision.
Career Highlights
Throughout his career, Koji Ibi has worked with prominent companies such as Fujitsu Corporation and Fujitsu Semiconductor Limited. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Ibi has collaborated with several talented individuals in his field, including Yuuichi Tachino and Minoru Suzuki. These collaborations have contributed to the advancement of his projects and the successful implementation of his inventions.
Conclusion
Koji Ibi's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to shape the industry and inspire future advancements.