Kyoto, Japan

Koichiro Hosokawa

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Nitta Haas Inc.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koichiro Hosokawa. Retrieved from https://idiyas.com/inventor/koichiro-hosokawa-e1cp3dak

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Koichiro Hosokawa: Innovator in Polishing Composition

Introduction

Koichiro Hosokawa is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of polishing compositions, particularly for tungsten-containing metal layers. His innovative approach has led to the development of a unique formulation that enhances the polishing process.

Latest Patents

Koichiro Hosokawa holds a patent for a polishing composition designed specifically for polishing tungsten-containing metal layers formed on insulating layers. This composition includes abrasive grains, one or more halogen acids such as iodic acid, iodous acid, and hypoiodous acid, a strong acid, a hydrogen-ion-supplying agent, and water. His patent represents a significant advancement in the materials used for polishing in various industrial applications.

Career Highlights

Throughout his career, Koichiro has been associated with Nitta Haas Inc., where he has applied his expertise in materials science to develop innovative solutions. His work has not only contributed to the company's success but has also advanced the industry standards for polishing compositions.

Collaborations

Koichiro has collaborated with talented individuals such as Yoshiharu Ota and Shoichiro Yoshida. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Koichiro Hosokawa's contributions to the field of polishing compositions highlight his role as a key innovator in the industry. His patent and collaborative efforts demonstrate his commitment to advancing technology in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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