Company Filing History:
Years Active: 1995-1997
Title: Koichi Yasui: Innovator in Silicide Targets for Sputtering
Introduction
Koichi Yasui is a notable inventor based in Kitaibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicide targets for sputtering. With a total of 4 patents to his name, Yasui's work has advanced the technology used in various applications.
Latest Patents
Yasui's latest patents focus on the creation of high-density silicide targets for sputtering. One of his innovations involves metal silicide targets that achieve a density of at least 99%. These targets are designed to minimize the presence of coarse silicon phases larger than 10 micrometers on the sputter surface, while also maintaining an oxygen content of no more than 150 ppm. The manufacturing method includes finely grinding synthesized silicide powder, vacuum annealing it in a hot press die, and then compacting and sintering the material to achieve the desired density. Another patent details silicide targets with a silicon phase area ratio of no more than 23% and a surface roughness between 0.05 micrometers and 1 micrometer. This innovation aims to reduce early-stage particle generation, thereby stabilizing the sputtering process.
Career Highlights
Throughout his career, Yasui has worked with prominent companies such as Japan Energy Corporation and Nikko Kyodo Co., Ltd. His experience in these organizations has contributed to his expertise in materials science and engineering.
Collaborations
Yasui has collaborated with notable colleagues, including Osamu Kano and Yasuhiro Yamakoshi. Their joint efforts have furthered advancements in the field of sputtering technology.
Conclusion
Koichi Yasui's contributions to the development of silicide targets for sputtering demonstrate his innovative spirit and commitment to advancing technology. His patents reflect a deep understanding of materials science, making him a significant figure in his field.