Kobe, Japan

Koichi Seto

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Toyo Boseki Kabushiki Kaisha. Active years: 1987.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Koichi Seto: Innovator in Lithographic Technology

Introduction

Koichi Seto is a notable inventor based in Kobe, Japan. He has made significant contributions to the field of lithographic technology. His innovative work has led to the development of a unique patent that enhances the capabilities of image-containing elements.

Latest Patents

One of Koichi Seto's key patents is titled "Dot-etchable image-containing element useful in lithographic mask." This patent describes a reducible image-containing element that comprises a support material and a photopolymerized layer. The photopolymerized layer features an image area that is cured at the upper part while remaining uncured at the lower part. The non-cured lower part contains at least one of polyvalent phenols and their derivatives, which effectively prevents it from curing. This innovation has potential applications in various lithographic processes.

Career Highlights

Koichi Seto is associated with Toyo Boseki Kabushiki Kaisha, a company known for its advancements in textile technology and materials. His work at the company has allowed him to focus on developing innovative solutions in the field of lithography.

Collaborations

Throughout his career, Koichi Seto has collaborated with notable colleagues, including Toshiaki Fujimura and Shinichi Tanaka. These collaborations have contributed to the advancement of technology in their respective fields.

Conclusion

Koichi Seto's contributions to lithographic technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the industry and inspire future innovations.

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