Company Filing History:
Years Active: 2005
Title: Koichi Miyazawa: Innovator in Microstructure Drying Treatment
Introduction
Koichi Miyazawa is a notable inventor based in Mito, Japan. He has made significant contributions to the field of microstructure drying treatment, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of drying substrates with fine patterns.
Latest Patents
Miyazawa holds a patent for a "Microstructure drying treatment method and its apparatus and its high pressure vessel." The objective of this invention is to provide a method that allows for the uniform drying of substrates with microstructures, specifically those with fine patterns of less than 30 nm. This method enables large-caliber substrates of 100 mm or more to be dried quickly without causing pattern collapse. The invention involves introducing a fluid that is gas at normal temperature and pressure but becomes liquid under high pressure inside a specialized high-pressure vessel.
Career Highlights
Koichi Miyazawa is associated with Hitachi Science Systems, Ltd., where he has been able to apply his expertise in developing advanced drying treatment methods. His innovative approach has positioned him as a key figure in the field of microstructure technology.
Collaborations
Miyazawa has collaborated with notable colleagues, including Hisayuki Taktsu and Toru Iwaya. Their combined efforts have contributed to the advancement of technologies related to microstructure drying treatments.
Conclusion
Koichi Miyazawa's contributions to the field of microstructure drying treatment exemplify the impact of innovative thinking in technology. His patent reflects a significant advancement in the ability to dry complex substrates efficiently.