Tokyo, Japan

Koichi Kimishima

This inventor holds 1 USPTO granted patent. Top assignees: Adeka Corporation, Toppan Printing Co., Ltd.. Active years: 2010.


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Koichi Kimishima: Innovator in Photosensitive Resin Technology

Introduction

Koichi Kimishima is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive resin compositions, particularly in the development of innovative materials for color filters.

Latest Patents

Kimishima holds a patent for an alkali-developable, colored photosensitive resin composition. This composition is achieved by adding a colorant and a photopolymerization initiator to an alkali-developable resin. The resin contains a reaction product obtained through esterification between an epoxy adduct and a polybasic acid anhydride. The epoxy adduct is formed by adding an unsaturated monobasic acid and a compound selected from a phenol compound, an alcohol compound, an amine compound, and a carboxylic acid to an epoxy resin. This innovative composition is designed to enhance the performance of color filters in various applications.

Career Highlights

Throughout his career, Koichi Kimishima has worked with prominent companies such as Toppan Printing Co., Ltd. and Adeka Corporation. His experience in these organizations has allowed him to refine his expertise in resin technology and contribute to advancements in the field.

Collaborations

Kimishima has collaborated with talented individuals, including Azumi Sato and Tadatoshi Maeda. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies.

Conclusion

Koichi Kimishima's work in the realm of photosensitive resin compositions exemplifies his innovative spirit and dedication to advancing technology. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
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