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For the Inventor, By the Inventor

Hitachi, Japan

Koichi Kamijima

This inventor holds 17 USPTO granted patents, primarily in Photosensitive Resin Technology. Top assignees: Hitachi Chemical Company, Ltd., Hitachi, Ltd., Hitachi Chemical Company, Co.. Active years: 1991-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Koichi Kamijima. Retrieved from https://idiyas.com/inventor/koichi-kamijima

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17

% Patents Active = 100.0

Average Co-Inventor Count = 5.3

ph-index = 6

Forward Citations = 88(Granted Patents)


Company Filing History:

goldMedal16 out of 1,641 
 
Hitachi Chemical Company, Ltd.
 patents
silverMedal3 out of 42,743 
 
Hitachi, Ltd.
 patents
bronzeMedal1 out of 3 
 
Hitachi Chemical Company, Co.
 patents
where one patent can have more than one assignee

Years Active: 1991-2001

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Areas of Expertise:
Photosensitive Resin
Fluorescent Pattern
Coating Composition
Antifouling Paint
Naphthalocyanine Derivatives
Optical Recording
Disiloxane Linkage
Dicarboxyphenyl
Tetraazaporphin
Varnish Composition
17 patents (USPTO):Explore Patents
1. 6248501 - Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same (2001-06-19),
2. 6077647 - Photosensitive resin composition, photosensitive film and process for (2000-06-20),
3. 5858616 - Photosensitive resin composition, photosensitive film and process for (1999-01-12),
4. 5773508 - Coating varnish composition and antifouling coating composition (1998-06-30),
5. 5646198 - Coating composition and antifouling paint (1997-07-08),
6. 5484685 - Naphthalocyanine derivatives, production thereof, optical recording (1996-01-16),
7. 5439512 - Resin composition and antifouling paint (1995-08-08),
8. 5439511 - Coating varnish composition and antifouling coating composition (1995-08-08),
9. 5284943 - Tatraazaporphin, process for producing the same, as well as optical (1994-02-08),
10. 5242917 - Tetracarboxylic acid dianhydride having disiloxane linkage and process (1993-09-07),
11. 5217856 - Tetraazaporphin, process for producing the same, as well as optical (1993-06-08),
12. 5214188 - 2,3-dicyanonaphthalene derivatives (1993-05-25),
13. 5166363 - Process for producing 1,3-bis(dicarboxyphenyl)-disiloxane derivative or (1992-11-24),
14. 5110968 - Naphthalocyanine derivatives, production thereof, optical recording (1992-05-05),
15. 5075203 - Naphthalocyanine derivatives, production thereof and optical recording (1991-12-24),

Title: The Innovations of Koichi Kamijima

Introduction

Koichi Kamijima is a prominent inventor based in Hitachi, Japan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive materials. With a total of 17 patents to his name, Kamijima has established himself as a key figure in innovation.

Latest Patents

His latest patents include a photosensitive resin composition and a photosensitive film, along with a process for preparing fluorescent patterns using these materials. These inventions are crucial for various applications in electronics and imaging technologies.

Career Highlights

Throughout his career, Kamijima has worked with notable companies such as Hitachi Chemical Company, Ltd. and Hitachi, Ltd. His work has been instrumental in advancing the capabilities of photosensitive materials, which are essential in modern technology.

Collaborations

Kamijima has collaborated with esteemed colleagues, including Seiji Tai and Nobuyuki Hayashi, to further enhance his research and development efforts.

Conclusion

Koichi Kamijima's contributions to the field of materials science and his innovative patents have had a lasting impact on technology. His work continues to inspire future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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