Company Filing History:
Years Active: 2000-2005
Title: Kohichi Arai: Innovator in Semiconductor Technology
Introduction
Kohichi Arai is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advancing the capabilities and efficiency of semiconductor devices.
Latest Patents
One of his latest patents is for a SOI MOSFET, which is a semiconductor device that includes a semiconductor layer formed on an insulator. This device features a gate insulating film, a gate electrode, source/drain regions, a body contact region, and both partial and full isolating regions. The design aims to enhance the performance and reliability of semiconductor devices.
Another notable patent is for a solid-state imaging device with a film of low hydrogen permeability. This invention involves a semiconductor substrate with a sensor that receives incident light. An intermediate-refractive-index film is placed on the entrance surface of the substrate, which helps suppress reflections of incident light. The film's design allows for hydrogen passage, improving the sensor's functionality.
Career Highlights
Kohichi Arai is currently employed at NEC Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in developing advanced semiconductor devices that meet the growing demands of modern technology.
Collaborations
He has collaborated with notable coworkers, including Takashi Nakano and Nobukazu Teranishi, contributing to various projects that enhance semiconductor technology.
Conclusion
Kohichi Arai's contributions to semiconductor technology through his patents and work at NEC Corporation highlight his role as a key innovator in the field. His inventions continue to influence the development of advanced electronic devices.