Kyoto, Japan

Kohei Maeda

This inventor holds 2 USPTO granted patents. Top assignee: Sanyo Chemical Industries, Ltd.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kohei Maeda. Retrieved from https://idiyas.com/inventor/kohei-maeda-glmcwe5x

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1999

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2 patents (USPTO):Explore Patents

Title: Kohei Maeda: Innovator in Photocurable Resin Technologies

Introduction

Kohei Maeda is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of photocurable resin technologies. With a total of 2 patents, Maeda's work has had a notable impact on various applications in the industry.

Latest Patents

Maeda's latest patents include innovative formulations such as a water-absorbent resin dispersion and a polyurethane composition. One of his key inventions is a photo-curing resin composition that comprises a propenyl ether group-containing compound. This compound has propenyl ether groups of a specific formula and a number-average molecular weight of not less than 500. Additionally, it includes a cationic photopolymerization initiator, showcasing his expertise in developing advanced materials.

Career Highlights

Kohei Maeda is currently employed at Sanyo Chemical Industries, Ltd., where he continues to push the boundaries of resin technology. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of Maeda's notable coworkers include Kazuya Otani and Masahiro Matsuoka. Their collective efforts contribute to the innovative environment at Sanyo Chemical Industries, Ltd.

Conclusion

Kohei Maeda's contributions to photocurable resin technologies highlight his role as a leading inventor in the industry. His patents reflect a commitment to innovation and excellence in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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