This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignees: Fujifilm Corporation, Wako Pure Chemical Industries, Inc.. Active years: 2018-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
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1 out of 299 Years Active: 2018-2025
Title: Kohei Hayashi: Innovator in Semiconductor Cleaning Solutions
Introduction
Kohei Hayashi is a notable inventor based in Kawagoe, Japan. He has made significant contributions to the field of semiconductor cleaning technologies. With a total of 4 patents to his name, Hayashi's work focuses on improving the efficiency and effectiveness of cleaning agents used in semiconductor manufacturing processes.
Latest Patents
Hayashi's latest patents include a kit for a cleaning agent and a method for preparing the cleaning agent. This invention addresses the challenge of providing a cleaning agent that maintains adequate impurity removal performance from semiconductor substrates after long-term storage. The kit is designed for cleaning semiconductor substrates that have undergone a Chemical Mechanical Planarization (CMP) process, with a pH range of 7.5 to 13.0. The kit comprises an acidic first liquid containing a specific compound and an alkaline second liquid containing a basic compound. Additionally, he has developed a treatment liquid that includes water, cationic and anionic compounds, and an oxidizing agent, ensuring it is free of abrasive grains and has a pH of 7.0 or less.
Career Highlights
Throughout his career, Kohei Hayashi has worked with prominent companies such as Fujifilm Corporation and Wako Pure Chemical Industries, Inc. His experience in these organizations has allowed him to refine his expertise in the development of cleaning agents for semiconductor applications.
Collaborations
Hayashi has collaborated with notable coworkers, including Takayuki Kajikawa and Tsutomu Watahiki. These partnerships have contributed to the advancement of his innovative solutions in the semiconductor cleaning sector.
Conclusion
Kohei Hayashi's contributions to the field of semiconductor cleaning technologies highlight his innovative spirit and dedication to improving manufacturing processes. His patents reflect a commitment to enhancing the performance of cleaning agents, which is crucial for the semiconductor industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile