Company Filing History:
Years Active: 2000
Title: **Inventor Spotlight: Kobayashi Katsuhiko**
Introduction
Kobayashi Katsuhiko is an innovative inventor based in Tokyo, Japan, recognized for his significant contributions to the field of charged particle beam exposure technologies. With a focus on enhancing the efficiency of exposure methods, Katsuhiko has developed a patent that stands as a testament to his ingenuity and dedication to his work.
Latest Patents
Kobayashi holds a patent for a **Method and Apparatus for Charged Particle Beam Exposure**. This invention outlines a novel method where a sample is exposed to a charged particle beam while being moved. The process involves generating speed data reflecting the speed distribution in the direction of the sample’s movement based on secondary data derived from a pattern data, including essential exposure pattern information. By implementing this innovative methodology, the through-put is significantly improved without any defects in the exposure process.
Career Highlights
Kobayashi is an accomplished inventor associated with Fujitsu Corporation, a well-renowned company in the technology sector. His tenure at Fujitsu has allowed him to collaborate on numerous projects that contribute to advancements in particle beam technologies. With a focus on research and development, he continues to influence the field positively through his work.
Collaborations
Throughout his career, Kobayashi has worked alongside talented colleagues such as Kenichi Kawakami and Masahiko Susa. These collaborations have fostered an environment of creativity and innovation, enabling them to push the boundaries of technology and make significant strides in their respective fields.
Conclusion
Kobayashi Katsuhiko exemplifies the spirit of innovation through his inventive thinking and remarkable contributions to charged particle beam technologies. His work not only enhances the industry’s efficiency but also inspires future generations of inventors and researchers in the field.