Taichung, Taiwan

Ko-Hsin Chang

This inventor holds 1 USPTO granted patent. Top assignee: China Medical University. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ko-Hsin Chang. Retrieved from https://idiyas.com/inventor/ko-hsin-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Ko-Hsin Chang: Innovator in Nanometal Dispersion Technology

Introduction

Ko-Hsin Chang is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of nanotechnology, particularly in the development of nanometal dispersions. His innovative approach combines various solutions to create advanced materials with unique properties.

Latest Patents

Ko-Hsin Chang holds a patent for a "Nanometal dispersion and method for preparing the same." This patent describes a method that involves mixing a metal seed crystal aqueous solution, a polysaccharide aqueous solution, and a metal compound aqueous solution. The resulting mixture undergoes a reduction-oxidation reaction to form a nanometal. The produced nanometal dispersion contains a polysaccharide composed of N-acetyl-D-glucosamine and glucuronic acid, along with a multimorphology nanometal. This innovative method showcases his expertise in material science and nanotechnology.

Career Highlights

Ko-Hsin Chang is affiliated with China Medical University, where he continues to advance research in nanotechnology. His work has implications for various applications, including medical and industrial fields. With a focus on developing new materials, he has established himself as a key figure in his area of expertise.

Collaborations

Ko-Hsin Chang collaborates with Chih-Wei Chou, contributing to the advancement of their research projects. Their partnership enhances the potential for innovative discoveries in nanotechnology.

Conclusion

Ko-Hsin Chang's contributions to nanometal dispersion technology highlight his innovative spirit and dedication to advancing material science. His work not only reflects his expertise but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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