Fuerth, Germany

Klaus Veit

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Isra Vision Gmbh. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Veit. Retrieved from https://idiyas.com/inventor/klaus-veit

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Klaus Veit - Innovator in Reflective Surface Detection

Introduction

Klaus Veit is a notable inventor based in Fuerth, Germany. He has made significant contributions to the field of surface detection technology. His innovative approach focuses on identifying local defects on reflective surfaces, which has important applications in various industries.

Latest Patents

Klaus Veit holds a patent for a "Method and device for detecting local defects on a reflective surface." This invention involves a method for detecting local defects using a device that includes at least one pattern for reflection on the surface, a camera, and a data processing unit. The device captures the reflected pattern and generates image data, which is then analyzed to determine any local defects based on the properties of the light-dark transitions in the image data. This technology enhances the accuracy and efficiency of defect detection.

Career Highlights

Klaus Veit is associated with Isra Vision GmbH, a company known for its expertise in machine vision and automation technology. His work at Isra Vision GmbH has allowed him to apply his innovative ideas in practical settings, contributing to advancements in the field.

Collaborations

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Conclusion

Klaus Veit is a pioneering inventor whose work in detecting defects on reflective surfaces showcases his innovative spirit and technical expertise. His contributions continue to influence the field of surface detection technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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