Raisdorf, Germany

Klaus Ulrich Parl

This inventor holds 1 USPTO granted patent. Top assignee: Linotype-Hell Ag. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Ulrich Parl. Retrieved from https://idiyas.com/inventor/klaus-ulrich-parl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Klaus Ulrich Parl: Innovator in Light Beam Deflection Technology

Introduction

Klaus Ulrich Parl is a notable inventor based in Raisdorf, Germany. He has made significant contributions to the field of optical technology, particularly with his innovative designs and patents. His work has been instrumental in advancing the capabilities of light beam deflection apparatuses.

Latest Patents

Klaus Ulrich Parl holds a patent for a "Light beam deflection apparatus having element for reducing air." This invention showcases his expertise in creating solutions that enhance the efficiency and effectiveness of optical devices. He has a total of 1 patent to his name.

Career Highlights

Parl is associated with Linotype-Hell AG, a company known for its advancements in typesetting and printing technology. His role at the company has allowed him to work on cutting-edge projects that push the boundaries of optical technology.

Collaborations

Throughout his career, Klaus has collaborated with various professionals in the field. One of his notable coworkers is Eckhard Lindemann, with whom he has likely shared insights and expertise to further their innovations.

Conclusion

Klaus Ulrich Parl's contributions to light beam deflection technology exemplify his dedication to innovation. His patent and work at Linotype-Hell AG highlight his role as a significant figure in the optical technology landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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