Röslau, Germany

Klaus Stöckl

This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignee: Ceramtec Gmbh. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Stöckl. Retrieved from https://idiyas.com/inventor/klaus-stöckl-6vxvrk8f

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 50.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: Klaus Stöckl: Innovator in Porous Aluminum Oxide Technology

Introduction

Klaus Stöckl is a notable inventor based in Röslau, Germany. He has made significant contributions to the field of materials science, particularly in the development of porous aluminum oxide substrates. With a total of 2 patents to his name, Stöckl's work has implications for various industrial applications.

Latest Patents

Stöckl's latest patents focus on a highly porous substrate material that features a mechanically stable, component-penetrating framework structure made of alpha-AlO. These inventions detail methods for producing the substrate material and explore its various uses in different applications.

Career Highlights

Klaus Stöckl is associated with Ceramtec GmbH, a company known for its expertise in advanced ceramics and materials. His work at Ceramtec has allowed him to push the boundaries of material innovation, particularly in the realm of porous structures.

Collaborations

Stöckl has collaborated with notable colleagues such as Roland Heinl and Peter Schröter. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Klaus Stöckl's contributions to the field of porous aluminum oxide technology highlight his role as a key innovator in materials science. His patents and collaborations continue to influence advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…