This inventor holds 1 USPTO granted patent. Top assignee: Sick Maihak Gmbh. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Klaus Smetana: Innovator in Light Measurement Technology
Introduction
Klaus Smetana is a notable inventor based in Emmendingen, Germany. He has made significant contributions to the field of optical measurement technology. His innovative approach has led to the development of a unique apparatus that enhances the accuracy of range of sight measurements.
Latest Patents
Klaus Smetana holds 1 patent for his invention titled "Scattered light range of view measurement apparatus." This patent describes a method and apparatus designed to determine a range of sight while monitoring and correcting the operability of the instrument. The invention features a light emitter that directs an emitted light beam to a measurement zone, while a light receiver captures the received light beam from the same zone. The emitted and received light beams intersect within the measurement zone, allowing for precise measurements.
Career Highlights
Klaus Smetana is currently employed at Sick Maihak GmbH, a company known for its advancements in measurement and automation technology. His work at Sick Maihak GmbH has allowed him to apply his innovative ideas in a practical setting, contributing to the company's reputation for excellence in the industry.
Collaborations
Throughout his career, Klaus has collaborated with talented individuals such as Juergen Kaufmann and Ingo Schiffler. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Klaus Smetana's contributions to the field of optical measurement technology exemplify the spirit of innovation. His patent for the scattered light range of view measurement apparatus showcases his ability to solve complex problems through inventive solutions. His work continues to influence the industry and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile