This inventor holds 1 USPTO granted patent and 2 published patent applications, plus 1 CIPO patent and 5 EPO patents. Top assignee: Durr Systems Gmbh. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: Klaus Rundel - Innovator in Paint Overspray Removal Technology
Introduction
Klaus Rundel is a notable inventor based in Esslingen, Germany. He has made significant contributions to the field of paint application technology, particularly with his innovative device designed to remove wet paint overspray. His work has implications for improving air quality and efficiency in painting processes.
Latest Patents
Klaus Rundel holds 1 patent for his invention titled "Device for removing wet paint overspray." This device is engineered to separate wet paint overspray from an exhaust air stream that contains overspray particles. The invention addresses the challenges posed by overspray during painting operations, ensuring that the exhaust air remains cleaner and more efficient. The device features a separation apparatus that includes a regeneratable surface filter, which plays a crucial role in maintaining the flow path of the exhaust air stream.
Career Highlights
Throughout his career, Klaus Rundel has worked with prominent companies in the industry, including Dürr Systems GmbH and Dürr Systems AG. His experience in these organizations has allowed him to refine his skills and contribute to advancements in paint application technologies.
Collaborations
Klaus has collaborated with notable colleagues such as Dietmar Wieland and Wolfgang Tobisch. These partnerships have fostered innovation and development in the field of paint overspray removal.
Conclusion
Klaus Rundel's contributions to the invention of devices for removing wet paint overspray highlight his commitment to improving industrial painting processes. His innovative solutions continue to influence the industry and promote better environmental practices.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
