This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 834,513 Years Active: 2001
Title: Klaus Roithner: Innovator in Trench Capacitor Fabrication
Introduction
Klaus Roithner is a notable inventor based in Assling, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of trench capacitors. His innovative approach has led to the development of a unique patent that enhances manufacturing processes.
Latest Patents
Klaus Roithner holds a patent for the "Fabrication of trench capacitors using disposable hard mask." This invention represents a breakthrough in the efficiency and effectiveness of semiconductor fabrication techniques. The patent showcases his expertise and commitment to advancing technology in this area. He has 1 patent to his name.
Career Highlights
Throughout his career, Klaus has demonstrated a strong dedication to innovation. His work has not only contributed to his personal achievements but has also influenced the broader field of semiconductor manufacturing. His insights and technical skills have positioned him as a valuable asset in the industry.
Collaborations
Klaus Roithner has collaborated with talented individuals such as Matthias Ilg and Richard L Kleinhenz. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Klaus Roithner is a distinguished inventor whose work in trench capacitor fabrication has made a lasting impact on the semiconductor industry. His innovative spirit and collaborative efforts continue to inspire advancements in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile