Company Filing History:
Years Active: 1991-2002
Title: Klaus Ohlrogge: Innovator in Gas Separation Technologies
Introduction
Klaus Ohlrogge is a notable inventor based in Geesthacht, Germany. He has made significant contributions to the field of gas separation technologies, holding a total of 7 patents. His work focuses on innovative methods for removing water vapor from pressurized gases and recovering gases from mixtures.
Latest Patents
Ohlrogge's latest patents include an arrangement for removing water vapor from pressurized gases or gas mixtures. This invention features a membrane separating apparatus that divides the gas-vapor stream into a vapor-enriched permeate stream and a vapor-depleted retentate stream. The vapor-enriched permeate stream is then directed to a vacuum pumping device, which generates a vacuum on the permeate side of the membrane, ensuring a predetermined trans-membrane pressure ratio. Another significant patent is a multi-stage process for the separation and recovery of gases. This process utilizes a membrane separating device to separate a gas and/or gas vapor mixture into a permeate enriched with gas and a retentate depleted of gas. The design includes a first membrane separating device followed by a second device, each tailored for specific gas separation tasks.
Career Highlights
Throughout his career, Klaus Ohlrogge has worked with Gkss-Forschungszentrum Geesthacht GmbH, where he has contributed to various research projects and innovations. His expertise in gas separation technologies has positioned him as a key figure in this field.
Collaborations
Ohlrogge has collaborated with notable colleagues such as Jan Wind and Klaus-Viktor Peinemann. These partnerships have further enhanced his research and development efforts in gas separation technologies.
Conclusion
Klaus Ohlrogge's innovative work in gas separation technologies has led to several important patents that address critical challenges in the field. His contributions continue to influence advancements in gas separation methods and applications.
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