Dormagen, Germany

Klaus Nickel

This inventor holds 1 USPTO granted patent. Top assignee: Bayer Aktiengesellschaft. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Nickel. Retrieved from https://idiyas.com/inventor/klaus-nickel-nzv2t2rn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: Klaus Nickel: Innovator in Filament Technology

Introduction

Klaus Nickel is a notable inventor based in Dormagen, Germany. He has made significant contributions to the field of polymer technology, particularly in the area of dry-spun filaments. His innovative approach has led to advancements that benefit various industries.

Latest Patents

Klaus Nickel holds a patent for a process aimed at removing residual solvent from dry-spun acrylonitrile polymer filaments. This process effectively reduces solvent levels to below 2% by weight through a multi-stage hot-wash method that utilizes minimal water. This invention is crucial for enhancing the quality and safety of polymer products.

Career Highlights

Klaus Nickel is associated with Bayer Aktiengesellschaft, a leading global company in the chemical and pharmaceutical sectors. His work at Bayer has allowed him to focus on innovative solutions that address industry challenges. His expertise in polymer technology has positioned him as a key figure in his field.

Collaborations

Throughout his career, Klaus Nickel has collaborated with esteemed colleagues such as Christian Pieper and Hans Uhlemann. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Klaus Nickel's contributions to the field of filament technology exemplify the impact of innovation in polymer science. His patent for solvent removal in dry-spun filaments showcases his commitment to advancing industry standards. His work continues to influence the future of polymer applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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