Kiel, Germany

Klaus Moellgaard

This inventor holds 1 USPTO granted patent. Top assignee: Dr. Ing. Rudolf Hell Gmbh. Active years: 1978.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Moellgaard. Retrieved from https://idiyas.com/inventor/klaus-moellgaard

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1978

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1 patent (USPTO):Explore Patents

Title: Klaus Moellgaard: Innovator in Weaving Technology

Introduction

Klaus Moellgaard is a notable inventor based in Kiel, Germany. He has made significant contributions to the field of weaving technology through his innovative ideas and patents. His work focuses on improving the efficiency and accuracy of pattern scanning in weaving processes.

Latest Patents

Klaus Moellgaard holds a patent for an "Apparatus and method for stepwise scanning of patterns." This invention involves a method for converting patterns for weaving into stored information by scanning the pattern according to a specific raster. The technology determines the number of steps per stitch of the scanning raster by using the quotient of the dimensions of the scanned pattern divided by the number of stitches in the same direction. A signal is generated to indicate the beginning of the next stitch, ensuring precision in the weaving process.

Career Highlights

Klaus Moellgaard has had a successful career, working with Dr. Ing. Rudolf Hell GmbH, a company known for its advancements in technology. His expertise in weaving technology has positioned him as a key figure in the industry.

Collaborations

Klaus has collaborated with Ulrich Sendtko, further enhancing the innovative capabilities within their field.

Conclusion

Klaus Moellgaard's contributions to weaving technology through his patent demonstrate his commitment to innovation and efficiency in the industry. His work continues to influence the way patterns are scanned and processed in weaving applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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