Chicago, IL, United States of America

Klaus Meck

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: John Crane Inc., Uchicago Argonne, LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Meck. Retrieved from https://idiyas.com/inventor/klaus-meck-8d7l5hc4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Klaus Meck: Innovator in Low Friction Coatings

Introduction

Klaus Meck is a notable inventor based in Chicago, IL (US). He has made significant contributions to the field of engineering, particularly in the development of low friction coatings. His innovative work has led to advancements in dry gas seal assemblies used in rotating machines.

Latest Patents

Klaus Meck holds a patent for a dry gas seal assembly that features a seal face coated with a solid mixture of molybdenum disulfide and graphene oxide. The patent specifies that the graphene oxide to molybdenum disulfide ratio should ideally be between 8:10 to 10:8. This invention aims to enhance the performance and durability of rotating machinery.

Career Highlights

Throughout his career, Klaus has worked with prominent companies such as John Crane Inc. and UChicago Argonne, LLC. His experience in these organizations has allowed him to apply his innovative ideas in practical settings, contributing to the advancement of technology in his field.

Collaborations

Klaus has collaborated with esteemed colleagues, including Anirudha V Sumant and Kalyan C Mutyala. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Klaus Meck's contributions to low friction coatings and dry gas seal assemblies exemplify his innovative spirit and dedication to engineering. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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