Holstebro, Denmark

Klaus Lauritsen

This inventor holds 1 USPTO granted patent. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Lauritsen. Retrieved from https://idiyas.com/inventor/klaus-lauritsen-ws1ozis0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 42(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Klaus Lauritsen: Innovator in 3-D Scenography

Introduction

Klaus Lauritsen is a notable inventor based in Holstebro, Denmark. He has made significant contributions to the field of 3-dimensional scenography. His innovative approach has led to the development of a unique patent that enhances visual experiences.

Latest Patents

Klaus holds a patent for "Glasses for 3-dimensional scenography." This invention aims to improve the way audiences perceive and interact with 3D environments. His work in this area showcases his commitment to advancing technology in visual arts.

Career Highlights

Klaus Lauritsen is associated with Toshiba Corporation, a leading company in technology and innovation. His role there has allowed him to collaborate with other talented professionals and contribute to groundbreaking projects. His patent reflects his expertise and dedication to enhancing visual experiences.

Collaborations

Klaus has worked alongside notable colleagues, including Takeshi Suzuki and Timothy Jacob Jensen. Their combined efforts have fostered a creative environment that encourages innovation and the development of new ideas.

Conclusion

Klaus Lauritsen is a distinguished inventor whose work in 3-dimensional scenography has made a lasting impact. His patent and collaborations highlight his significant contributions to the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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