Munich, Germany

Klaus Lang

This inventor holds 1 USPTO granted patent. Top assignee: Linotype-Hell Ag. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Lang. Retrieved from https://idiyas.com/inventor/klaus-lang-wk0j8szq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Klaus Lang - Innovator in Gray Proof Generation

Introduction

Klaus Lang is a notable inventor based in Munich, Germany. He has made significant contributions to the field of printing technology, particularly in the area of gray proof generation. His innovative approach has led to the development of a unique method that enhances the quality of printed materials.

Latest Patents

Klaus Lang holds a patent for a "Method for generating a screened gray proof having gray values from a." This patent showcases his expertise in improving the accuracy and quality of gray proofs, which are essential in the printing industry.

Career Highlights

Throughout his career, Klaus has been associated with Linotype-Hell AG, a company renowned for its advancements in typesetting and printing technology. His work at Linotype-Hell AG has positioned him as a key player in the development of innovative printing solutions.

Collaborations

Klaus has collaborated with talented individuals such as Thomas Kohler and Andreas Netthorn. These partnerships have fostered a creative environment that has led to the advancement of printing technologies.

Conclusion

Klaus Lang's contributions to the field of printing technology, particularly through his patented method for gray proof generation, highlight his innovative spirit and dedication to quality. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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