This inventor holds 2 USPTO granted patents. Top assignees: Cummins Inc., Hilite Germany Gmbh. Active years: 2012-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012-2015
Title: Klaus Lang: Innovator in Exhaust-Gas Aftertreatment Technology
Introduction
Klaus Lang is a notable inventor based in Klingenberg, Germany. He has made significant contributions to the field of exhaust-gas aftertreatment technology. With a total of 2 patents to his name, Lang has developed innovative solutions that enhance the efficiency and effectiveness of exhaust systems.
Latest Patents
Lang's latest patents focus on an exhaust-gas aftertreatment device. This device includes a control unit that manages a diaphragm pump, which draws a urea/water solution from a circuit. The solution is then pumped through a pressure filter to a metering unit. This metering unit features an atomizing nozzle that atomizes the urea/water solution into the exhaust-gas stream. Additionally, the metering unit may incorporate a metering valve, a pressure and temperature sensor, heating means, and a return baffle. These advancements aim to improve the performance of exhaust-gas aftertreatment systems.
Career Highlights
Throughout his career, Klaus Lang has worked with prominent companies in the automotive industry. Notable among these are Hilite Germany GmbH and Cummins Inc. His experience in these organizations has allowed him to refine his expertise in exhaust-gas aftertreatment technologies.
Collaborations
Lang has collaborated with several professionals in his field, including Friedrich Johann Zapf and Heico Stegmann. These partnerships have contributed to the development of innovative solutions in exhaust-gas aftertreatment.
Conclusion
Klaus Lang is a distinguished inventor whose work in exhaust-gas aftertreatment technology has made a significant impact. His patents and collaborations reflect his commitment to innovation and excellence in this critical area of engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

