Rodgau, Germany

Klaus Hossner

This inventor holds 1 USPTO granted patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Hossner. Retrieved from https://idiyas.com/inventor/klaus-hossner-xldk7c6w

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1987

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1 patent (USPTO):Explore Patents

Title: Klaus Hossner: Innovator in Coating Solutions

Introduction

Klaus Hossner is a notable inventor based in Rodgau, Germany. He has made significant contributions to the field of coating solutions, particularly in the production of light-sensitive reproduction materials. His innovative approach has led to the development of a unique process that addresses viscosity challenges in coating solutions.

Latest Patents

Klaus Hossner holds 1 patent for his invention titled "Process for lowering the viscosity of coating solutions containing a thixotropy-causing filler for the production of light-sensitive reproduction materials." This patent involves the addition of specific compounds to reduce viscosity, enhancing the performance of coating solutions.

Career Highlights

Hossner has built a successful career at E.I. DuPont De Nemours and Company, where he has applied his expertise in material science. His work has been instrumental in advancing the company's capabilities in producing high-quality coating solutions.

Collaborations

Throughout his career, Klaus has collaborated with esteemed colleagues, including Manfred A Sondergeld and Dietmar Dudek. These partnerships have fostered innovation and contributed to the success of various projects within the company.

Conclusion

Klaus Hossner's contributions to the field of coating solutions exemplify the impact of innovative thinking in material science. His patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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