This inventor holds 3 USPTO granted patents. Top assignee: Basf Aktiengesellschaft. Active years: 1984-1985.
Company Filing History:
Years Active: 1984-1985
Title: Klaus Holoch: Innovator in Image-Recording Materials
Introduction
Klaus Holoch is a notable inventor based in Bobenheim-Roxheim, Germany. He has made significant contributions to the field of image-recording materials, holding a total of 3 patents. His work focuses on advancements that enhance the efficiency and effectiveness of image-recording technologies.
Latest Patents
Holoch's latest patents include innovative developments in resist films. One of his key inventions involves a resist film that comprises a dimensionally stable base, which is transparent to actinic light in the wavelength range from 300 to 420 nm. This film features a mask-forming layer that is sensitive to heat radiation and contains a thermochromic system. When irradiated with an IR laser, this system undergoes an irreversible change in its absorption spectrum, significantly altering the optical density of the mask-forming layer. This technology is particularly useful for creating UV photomasks that are essential for exposing photosensitive recording materials.
Career Highlights
Klaus Holoch has built a successful career at BASF Aktiengesellschaft, a leading chemical company known for its innovative solutions. His work has not only contributed to the company's portfolio but has also advanced the field of image-recording materials.
Collaborations
Holoch has collaborated with several talented individuals in his field, including Helmut Barzynski and Andreas Henne. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Klaus Holoch's contributions to image-recording materials exemplify the impact of innovation in technology. His patents reflect a commitment to advancing the field and improving the efficiency of image-recording processes.