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Leverkusen, Germany

Klaus Hoffmann

This inventor holds 4 USPTO granted patents. Top assignee: Agfa-Gevaert Ag. Active years: 1977-1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Hoffmann. Retrieved from https://idiyas.com/inventor/klaus-hoffmann-unnbdpm8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4

% Patents Active = 100.0

Average Co-Inventor Count = 1.7

ph-index = 3

Forward Citations = 38(Granted Patents)


Company Filing History:

goldMedal4 out of 1,473 
 
Agfa-Gevaert Ag
 patents

Years Active: 1977-1988

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4 patents (USPTO):Explore Patents
1. 4758505 - Process and an apparatus for the production of photographic silver (1988-07-19),
2. 4210918 - Ink jet printer (1980-07-01),
3. 4106027 - Ink for the ink jet process (1978-08-08),
4. 4017869 - Ink recorder for the jet-ink-process (1977-04-12),

Title: Klaus Hoffmann - Innovative Inventor from Leverkusen

Introduction: Klaus Hoffmann is a renowned inventor hailing from Leverkusen, Germany, known for his groundbreaking contributions to various fields of technology and science.

Latest Patents: Klaus Hoffmann holds several patents in the areas of renewable energy, sustainable materials, and advanced robotics, showcasing his commitment to creating a more efficient and eco-friendly world.

Career Highlights: With over two decades of experience in research and development, Klaus Hoffmann has worked for leading tech companies and research institutions, where he has spearheaded projects that have revolutionized industries.

Collaborations: Throughout his career, Klaus Hoffmann has collaborated with top engineers, scientists, and designers from around the globe, fostering a culture of innovation and excellence in all his projects.

Conclusion: Klaus Hoffmann's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor, shaping the future of technology and leaving a lasting impact on society.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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