Isernhagen, Germany

Klaus Hiemann

This inventor holds 1 USPTO granted patent. Top assignee: Polygram Gmbh. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Hiemann. Retrieved from https://idiyas.com/inventor/klaus-hiemann

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1981

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Klaus Hiemann: Innovator in Acoustic Measurement Technology

Introduction

Klaus Hiemann is a notable inventor based in Isernhagen, Germany. He has made significant contributions to the field of acoustic measurement technology. His innovative approach has led to the development of a unique device that enhances the accuracy of measuring acoustic reverberation time.

Latest Patents

Klaus Hiemann holds a patent for a "Device for the measurement of acoustic reverberation time and method." This device incorporates a transmission unit and a reception unit combined into one assembly. Both units utilize a single series of filters, with one filter inserted into the signal path for both the transmission and reception units. This design allows for precise measurement of acoustic reverberation time in various environments, such as recording rooms and sound studios.

Career Highlights

Klaus Hiemann is currently employed at Polygram GmbH, where he continues to work on advancements in acoustic technology. His expertise and innovative mindset have positioned him as a key figure in his field.

Collaborations

Klaus collaborates with Jost-Michael Haase, contributing to the development of cutting-edge acoustic measurement solutions.

Conclusion

Klaus Hiemann's work in acoustic measurement technology exemplifies innovation and dedication. His contributions have the potential to significantly impact the way acoustic environments are analyzed and understood.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…