Kiel, Germany

Klaus Gunter Leiss

This inventor holds 1 USPTO granted patent. Top assignee: Linotype-Hell Ag. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Gunter Leiss. Retrieved from https://idiyas.com/inventor/klaus-gunter-leiss

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Klaus Gunter Leiss: Innovator in Recording Material Exposure

Introduction

Klaus Gunter Leiss is a notable inventor based in Kiel, Germany. He has made significant contributions to the field of recording materials through his innovative methods and apparatus. With a focus on advancing technology, Leiss has secured a patent that showcases his expertise and creativity.

Latest Patents

Klaus Gunter Leiss holds a patent for a "Method and apparatus for exposing recording material having a." This invention reflects his commitment to enhancing the efficiency and effectiveness of recording technologies. His patent portfolio includes 1 patent, highlighting his contributions to the industry.

Career Highlights

Leiss is associated with Linotype-Hell AG, a company known for its advancements in typesetting and printing technologies. His work at Linotype-Hell AG has allowed him to collaborate with other talented professionals in the field, furthering his impact on the industry.

Collaborations

One of his notable coworkers is Jorg Achim Fischer. Their collaboration has likely contributed to the innovative projects at Linotype-Hell AG, fostering an environment of creativity and technological advancement.

Conclusion

Klaus Gunter Leiss is a distinguished inventor whose work in recording material exposure has made a lasting impact on the industry. His patent and career at Linotype-Hell AG exemplify his dedication to innovation and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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