Schaffhausen, Switzerland

Klaus Buchner

This inventor holds 1 USPTO granted patent. Top assignee: Alusuisse-Lonza Services Ltd.. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klaus Buchner. Retrieved from https://idiyas.com/inventor/klaus-buchner-k9exseey

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Klaus Buchner: Innovator in Polymer Technology

Introduction

Klaus Buchner is a notable inventor based in Schaffhausen, Switzerland. He has made significant contributions to the field of polymer technology, particularly with his innovative approaches to polymer-containing mixtures. His work has implications for various applications, including multi-layered composite panels.

Latest Patents

Klaus Buchner holds a patent for a polymer-containing mixture that exhibits elevated resistance to flow under the influence of heat. This mixture can be processed into core layers in multi-layered composite panels. The formulation of this polymer-containing mixture includes 50 to 75 wt. % of filler materials such as aluminum hydroxide or magnesium hydroxide, combined with 25 to 50 wt. % of a polymer mixture.

Career Highlights

Throughout his career, Klaus Buchner has been associated with Alusuisse-Lonza Services Ltd., where he has focused on advancing polymer technologies. His expertise in this area has led to the development of innovative materials that enhance the performance of composite structures.

Conclusion

Klaus Buchner's contributions to polymer technology through his patent and work at Alusuisse-Lonza Services Ltd. highlight his role as an influential inventor in the field. His innovative polymer-containing mixture represents a significant advancement in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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