Wiltz, Luxembourg

Klass Kackmann-Schneider

This inventor holds 1 USPTO granted patent. Top assignee: Tarkett Gdl S.a.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Klass Kackmann-Schneider. Retrieved from https://idiyas.com/inventor/klass-kackmann-schneider

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations by Klass Kackmann-Schneider

Introduction

Klass Kackmann-Schneider is a notable inventor based in Wiltz, Luxembourg. He has made significant contributions to the field of decorative surface coverings, particularly through his innovative patent.

Latest Patents

Kackmann-Schneider holds a patent for "Printed decorative surface coverings." This invention relates to a primer layer designed to enhance the printability of floor or wall coverings using aqueous ink compositions. The primer layer consists of one or more acrylic copolymers and silica, while the covering itself is made from polyvinyl chloride. This innovation aims to improve the quality and durability of printed surfaces.

Career Highlights

Klass Kackmann-Schneider is associated with Tarkett Gdl S.a., a company known for its expertise in flooring solutions. His work at Tarkett has allowed him to focus on developing advanced materials that meet the evolving needs of the market.

Collaborations

Kackmann-Schneider has collaborated with talented professionals such as Luc Forget and Igor Brankov. These partnerships have contributed to the successful development of his innovative products.

Conclusion

Klass Kackmann-Schneider's work in the field of decorative surface coverings showcases his commitment to innovation and quality. His patent reflects a significant advancement in the industry, demonstrating the importance of research and development in creating effective solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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