Tokyo, Japan

Kiyoshi Onohara

USPTO Granted Patents = 13 


 

Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Chiyoda-ku, JP (2017 - 2018)
  • Tokyo, JP (2012 - 2024)

Company Filing History:


Years Active: 2012-2025

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13 patents (USPTO):Explore Patents

Title: Kiyoshi Onohara: Innovator in Optical Measurement Technology

Introduction

Kiyoshi Onohara is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of optical measurement technology, holding a total of 13 patents. His work has been instrumental in advancing the capabilities of optical distance measurement devices.

Latest Patents

Onohara's latest patents include an innovative optical distance measurement device. This device features a beam splitter that divides a laser beam into measurement light and reference light. It incorporates a first optical system that emits the first measurement light to a target object and a second optical system that emits the second measurement light. The device also includes receivers that capture the reflected light and output signals indicating the reference and reflection light. Another notable patent is the optical distance measurement device and machining device, which calculates optical path lengths and refractive indices to determine distances accurately.

Career Highlights

Kiyoshi Onohara is currently employed at Mitsubishi Electric Corporation, where he continues to develop cutting-edge technologies. His work has not only enhanced the precision of optical measurements but has also contributed to various applications in different industries.

Collaborations

Onohara has collaborated with notable coworkers such as Hiroki Goto and Tsuyoshi Yoshida. Their combined expertise has fostered innovation and progress in their projects.

Conclusion

Kiyoshi Onohara's contributions to optical measurement technology exemplify the impact of innovative thinking in engineering. His patents reflect a commitment to advancing technology and improving measurement accuracy.

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