Yokohama, Japan

Kiyoshi Ohno

This inventor holds 1 USPTO granted patent. Top assignee: Japan Oxygen, Co., Ltd.. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kiyoshi Ohno. Retrieved from https://idiyas.com/inventor/kiyoshi-ohno-8ywzvufr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Kiyoshi Ohno: Innovator in Glass Production

Introduction

Kiyoshi Ohno is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of glass production, particularly through his innovative patent that enhances the quality and cost-effectiveness of glass manufacturing.

Latest Patents

Kiyoshi Ohno holds a patent for a process for the production of glass. This process utilizes the vacuum melting method with silica as a raw material. The method involves filing a silica fine powder in a suitable vessel, heating it in the presence of an accelerator for phase conversion, and subsequently heating and melting the formed body in a vacuum. This innovative approach allows for the production of a transparent and active glass of high quality at a lower cost.

Career Highlights

Ohno's career is marked by his dedication to advancing glass production techniques. His work has not only improved the efficiency of glass manufacturing but has also contributed to the development of high-quality glass products.

Collaborations

Kiyoshi Ohno has collaborated with notable colleagues such as Hiroshi Morishita and Hiroshi Yokota. Their combined expertise has furthered advancements in the field of glass production.

Conclusion

Kiyoshi Ohno's contributions to glass production through his innovative patent demonstrate his commitment to enhancing manufacturing processes. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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