Ibaraki, Japan

Kiyoshi Niinuma

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi Koki Co., Ltd.. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kiyoshi Niinuma. Retrieved from https://idiyas.com/inventor/kiyoshi-niinuma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Kiyoshi Niinuma: Innovator in Xerography Technology

Introduction

Kiyoshi Niinuma is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of xerography, particularly through his innovative patent. His work has had a lasting impact on the technology used in developing apparatuses for xerography.

Latest Patents

Kiyoshi Niinuma holds a patent for a developing apparatus for xerography. This apparatus includes a developing roll, a regulator member for controlling developer thickness located proximate to the developing roll, and an elastic plate member arranged to elastically apply pressure to uniformly spread the developer on the developing roll. This invention enhances the efficiency and quality of xerographic processes.

Career Highlights

Kiyoshi Niinuma is associated with Hitachi Koki Co., Ltd., where he has been able to apply his expertise in developing innovative technologies. His career reflects a commitment to advancing the field of xerography through practical and effective solutions.

Collaborations

Throughout his career, Kiyoshi has collaborated with talented individuals such as Junji Kobayashi and Hiroyoshi Tokoro. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Kiyoshi Niinuma's contributions to xerography technology exemplify the spirit of innovation. His patent and work at Hitachi Koki Co., Ltd. highlight his dedication to improving the efficiency of developing apparatuses. His legacy in the field continues to inspire future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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