Company Filing History:
Years Active: 2017-2019
Title: Kiyoshi Maeshima: Innovator in Semiconductor Manufacturing
Introduction
Kiyoshi Maeshima is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of semiconductor devices.
Latest Patents
Maeshima's latest patents include a manufacturing method of semiconductor devices. This method involves several key steps, such as preparing a semiconductor substrate with a silicon nitride film on its rear surface. It also includes forming an interlayer insulating film with a via hole on the main surface of the substrate and selectively forming a via-fill within the via hole. Additionally, the method requires performing wafer rear surface cleaning to expose the silicon nitride film and forming a photoresist film made of chemical amplification type resist on the interlayer insulating film and the via-fill. The semiconductor substrate must be stored in an atmosphere with an ammonium ion concentration of 1000 µg/m³ or less.
Career Highlights
Kiyoshi Maeshima is currently employed at Renesas Electronics Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing manufacturing processes that enhance the performance of semiconductor devices.
Collaborations
Maeshima collaborates with talented coworkers, including Kotaro Horikoshi and Katsuhiko Hotta. Their combined expertise contributes to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Kiyoshi Maeshima is a prominent figure in semiconductor manufacturing, with a focus on innovative methods that improve device performance. His contributions and collaborations continue to shape the future of technology in this vital field.