This inventor holds 2 USPTO granted patents. Top assignee: Cypress Semiconductor Corporation. Active years: 2004-2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004-2006
Title: Kiyoko Ikeuchi: Semiconductor Process Inventor
Introduction
Kiyoko Ikeuchi is an inventor based in Sunnyvale, California, whose patent work focuses on semiconductor manufacturing processes. She is credited with 2 patents and is associated with Cypress Semiconductor Corporation.
Latest Patents
Ikeuchi’s listed patent work includes a gate etch process for making a semiconductor structure. The method etches an anti-reflective coating layer at a pressure of 10 millitorr or less, then etches a nitride layer using two plasma steps. The first nitride etch plasma has a higher fluorine-to-carbon (F:C) ratio than the second.
Career Highlights
Ikeuchi’s work reflects an interest in precise control of semiconductor etching. The described process uses different plasma compositions in successive steps to shape the nitride layer during device fabrication.
Collaborations
Her listed coworkers include Chan-Lon Yang and Lien Lee. Her association with Cypress Semiconductor Corporation places her work within the semiconductor industry.
Conclusion
Kiyoko Ikeuchi’s patent work centers on a staged gate etch process that applies controlled plasma conditions to semiconductor structures.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile