Tokyo, Japan

Kiyohisa Nakamura

This inventor holds 1 USPTO granted patent. Top assignee: Agc Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kiyohisa Nakamura. Retrieved from https://idiyas.com/inventor/kiyohisa-nakamura-e6yalakg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kiyohisa Nakamura: Innovator in Cell Culture Technology

Introduction

Kiyohisa Nakamura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of cell culture technology. His innovative work has led to the development of a unique cell culture container that enhances the efficiency of cell growth and research.

Latest Patents

Nakamura holds a patent for a substrate of a cell culture container, which features a bottom face and a surface with a dent-formed region. This region contains a plurality of dents with an average depth of 200 μm or more. The patent includes specific formulas that define the angles formed by tangent lines and the refractive index of the substrate, ensuring optimal conditions for cell culture.

Career Highlights

Kiyohisa Nakamura is currently employed at AGC Inc., where he continues to innovate in the field of biotechnology. His work has been instrumental in advancing cell culture methodologies, which are crucial for various biological and medical applications.

Collaborations

Nakamura collaborates with Kensuke Ono, a fellow innovator in the field. Together, they work on projects that aim to improve cell culture techniques and contribute to advancements in biotechnology.

Conclusion

Kiyohisa Nakamura's contributions to cell culture technology exemplify the impact of innovative thinking in scientific research. His patented inventions are paving the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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