Kiyofumi Nishii

Title: Kiyofumi Nishii: Innovator in Substrate Heat Treatment Technology

Introduction

Kiyofumi Nishii is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate heat treatment technology. With a total of 3 patents to his name, Nishii's work focuses on improving the efficiency and effectiveness of heat processing apparatuses.

Latest Patents

Nishii's latest patents include a substrate heat treatment apparatus and an apparatus for heat processing a substrate. The substrate heat treatment apparatus features a flat configuration with a cavity designed to accommodate a substrate. It includes a gas supply unit, an opening for communication with the outside world, and a gas discharge unit. This innovative design ensures uniform gas flow during substrate loading and heat treatment, preventing outside air from entering the furnace and avoiding stagnation of process gas. The apparatus for heat processing a substrate also emphasizes gas flow management, utilizing a gas introduction unit that reduces flow velocity and optimizes the heat processing environment.

Career Highlights

Kiyofumi Nishii is associated with Dainippon Screen Mfg. Co., Ltd., a company known for its advanced manufacturing technologies. His work has been instrumental in developing solutions that enhance substrate processing, which is critical in various industries, including electronics and materials science.

Collaborations

Nishii has collaborated with notable coworkers such as Takatoshi Chiba and Toshihiro Nakajima. Their combined expertise has contributed to the advancement of substrate heat treatment technologies.

Conclusion

Kiyofumi Nishii's innovative contributions to substrate heat treatment technology have established him as a key figure in this field. His patents reflect a commitment to improving manufacturing processes and enhancing product quality.