The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 1994

Filed:

Oct. 11, 1991
Applicant:
Inventors:

Mitsukazu Takahashi, Kyoto, JP;

Takatoshi Chiba, Kyoto, JP;

Kiyofumi Nishii, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B / ; H01L / ; H01L / ;
U.S. Cl.
CPC ...
219497 ; 21912143 ; 219494 ; 392418 ; 437248 ; 437173 ;
Abstract

A temperature measuring device for measuring the temperature of a wafer heated by light irradiation includes: a sheath thermocouple for detecting the temperature of a wafer to be measured by contacting the wafer to be measured; and a covering member for covering the surface of the sheath thermocouple. The surface of the covering member is flat in a predetermined region, and the part in the region can plane-contact the surface of the wafer. Thus, the temperature of the wafer can be measured accurately and in a stable manner, and the wafer surface is free from contamination with adhesives or the metal of the thermocouple.

Published as:
JPH04148545A; US5315092A; JP2780866B2;

Find Patent Forward Citations

Takahashi, Mitsukazu. (1994). Apparatus for heat-treating wafer by light-irradiation and device for (U.S. Patent No. 5315092). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5315092

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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