This inventor holds 2 USPTO granted patents. Top assignee: Kokusai Electric Corporation. Active years: 2022-2023.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2022-2023
Title: Kiyoaki Yamada: Innovator in Substrate Processing Technology
Introduction
Kiyoaki Yamada is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of substrate processing technology. With a total of 2 patents, Yamada has demonstrated his expertise and innovative spirit in developing advanced solutions for the industry.
Latest Patents
Yamada's latest patents include an end effector for handling wafers and a reaction tube structure for substrate processing apparatus. The substrate processing apparatus he developed features a reaction tube that defines a substrate processing chamber. It includes a gas inlet at the lower portion of the reaction tube to supply a process gas. Additionally, a first buffer unit is designed to temporarily retain the process gas, located at one side of the inner surface of the reaction tube and equipped with multiple gas supply holes. A gas outlet is positioned on the opposite side of the inner surface to exhaust the process gas from the processing chamber. The process gas is supplied through the gas supply holes into the process chamber, where it passes through and is then exhausted through the gas outlet.
Career Highlights
Yamada is currently employed at Kokusai Electric Corporation, where he continues to innovate and contribute to the field. His work has been instrumental in advancing substrate processing technologies, which are crucial for various applications in the semiconductor industry.
Collaborations
Yamada has collaborated with notable coworkers, including Tetsuya Marubayashi and Satoru Murata. Their combined expertise has fostered a productive environment for innovation and development.
Conclusion
Kiyoaki Yamada is a distinguished inventor whose work in substrate processing technology has led to significant advancements in the field. His contributions, particularly through his latest patents, highlight his commitment to innovation and excellence.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
