Suwon, South Korea

Kitano Toshiaki

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kitano Toshiaki. Retrieved from https://idiyas.com/inventor/kitano-toshiaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2008

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Kitano Toshiaki

Introduction

Kitano Toshiaki is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of optical disk technology. His work focuses on improving recording performance in optical disk systems.

Latest Patents

Toshiaki holds a patent for a "Method of determining recording power for recordable optical disk in optical disk system." This innovative method minimizes the time required to determine the optimum recording power for each recording speed. As a result, it enhances the overall recording performance of optical disks.

Career Highlights

Toshiaki is currently employed at Samsung Electronics Co., Ltd., a leading technology company known for its advancements in electronics and digital technology. His role at Samsung allows him to work on cutting-edge projects that push the boundaries of optical disk technology.

Collaborations

Toshiaki collaborates with various professionals in his field, including his coworker Soo-yong Kim. Their combined expertise contributes to the development of innovative solutions in optical disk systems.

Conclusion

Kitano Toshiaki's contributions to optical disk technology exemplify the impact of innovation in enhancing recording performance. His work continues to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…