Cheonan-si, South Korea

Kisang Eum

USPTO Granted Patents = 5 

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Chungcheongnam-do, KR (2020)
  • Cheonan-si, KR (2018 - 2024)

Company Filing History:


Years Active: 2018-2025

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5 patents (USPTO):Explore Patents

Title: Innovations by Inventor Kisang Eum

Introduction

Kisang Eum is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of substrate processing technology. With a total of 5 patents to his name, Eum's work focuses on enhancing the efficiency and effectiveness of substrate treatment processes.

Latest Patents

Kisang Eum's latest patents include several innovative devices and methods. One of his notable inventions is a cleaning jig designed for a substrate treating apparatus. This apparatus features a rotatable spin head and a surrounding cup that works in conjunction with the cleaning jig to discharge cleaning liquid effectively. The cleaning jig is equipped with spattering guide grooves that utilize centrifugal force to enhance the cleaning process. Another significant patent involves a substrate alignment apparatus and processing method. This technology includes a support plate and guide units that ensure precise alignment of substrates, preventing any negative impact during transfer between process chambers.

Career Highlights

Eum's career is marked by his dedication to advancing substrate processing technologies. His innovative designs have improved the reliability and performance of substrate treatment systems. His work has been instrumental in addressing challenges faced in the semiconductor manufacturing industry.

Collaborations

Kisang Eum has collaborated with several talented individuals in his field, including Chang Suk Oh and Sang Eun Noh. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies.

Conclusion

Kisang Eum's contributions to substrate processing technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate treatment, making him a valuable figure in the industry.

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