Chiba, Japan

Kisaburo Yoshida

This inventor holds 1 USPTO granted patent. Top assignee: Seiko Instruments Inc. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kisaburo Yoshida. Retrieved from https://idiyas.com/inventor/kisaburo-yoshida

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Kisaburo Yoshida: Innovator in End Face Polishing Technology

Introduction

Kisaburo Yoshida is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of polishing technology, particularly with his innovative end face polishing device. His work has garnered attention for its unique design and functionality.

Latest Patents

Yoshida holds a patent for an end face polishing device. This device features a first revolution shaft that undergoes revolving movement about a first axis, a rotational shaft that rotates about a second axis eccentric from the first axis, and a second revolution shaft that revolves about a third axis eccentric from the second axis. A polishing disc is connected to the second revolution shaft, allowing for efficient polishing operations.

Career Highlights

Kisaburo Yoshida is associated with Seiko Instruments Inc., where he has been instrumental in developing advanced polishing technologies. His expertise in this area has led to the creation of innovative solutions that enhance manufacturing processes.

Collaborations

Yoshida has worked alongside talented colleagues, including Kouji Minami and Hisayuki Hirayama. Their collaborative efforts have contributed to the advancement of polishing technology within their organization.

Conclusion

Kisaburo Yoshida's contributions to the field of polishing technology exemplify his innovative spirit and dedication to improving manufacturing processes. His patent for the end face polishing device showcases his ability to create practical solutions that meet industry needs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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